Plasma Deposition of Amorphous Silicon-Based Materials

ISBN: 9780121379407 出版年：1995 页码：339 Academic Press_RM

Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced.Focuses on the plasma chemistry of amorphous silicon-based materialsLinks fundamental growth kinetics with the resulting semiconductor film properties and performance of electronic devices producedFeatures an international group of contributorsProvides the first comprehensive coverage of the subject, from deposition technology to materials characterization to applications and implementation in state-of-the-art devices