----- 氮化物半导体
Preface.List of Contributors.PART 1: MATERIAL.1. High-Pressure Crystallization of GaN (I. Grzegory, et al.).2. Epitaxial Lateral Overgrowth of GaN (P. Gibart, et al.).3. Plasma-Assisted Molecular Beam Epitaxy of III-V Nitrides (A. Georgakilas, et al.).4. Growth of Gallium Nitride by Hydride Vapor Phase Epitaxy (A. Trassoudaine, et al.).5. Growth and Properties of InN (V. Davydov, et al.).6. Surface Structure and Adatom Kinetics of Group-III Nitrides (J. Neugebauer).PART 2: DEFECTS AND INTERFACES.7. Topological Analysis of Defects in Nitride Semiconductors (G. Dimitrakopulos, et al.).8. Extended Defects in Wurtzite GaN Layers: Atomic Structure, Formation, and Interaction Mechanisms (P. Ruterana, et al.).9. Stain, Chemical Composition, and Defects Analysis at Atomic Level in GaN-based Epitaxial Layers (S. Kret, et al.).PART 3: PROCESSING AND DEVICES.10. Ohmic Contacts to GaN (P. Hartlieb, et al.). 11. Electroluminescent Diodes and Laser Diodes (H. Amano).12. GaN-Based Modulation-Doped FETs and Heterojunction Bipolar Transistors ( H. Morkoc & L. Liu).13. GaN-Based UV Photodetectors (F. Omnes & E. Monroy).Subject Index.
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