Silicon, Germanium, and Their Alloys —— Growth, Defects, Impurities, and Nanocrystals

----- 硅、锗、及其合金:增长、缺陷、杂质和纳米晶体

ISBN: 9781466586642 出版年：2014 页码：424 CRC Press

Preface Editors Contributors Modern Aspects of Czochralski and Multicrystalline Silicon Crystal Growth Koichi Kakimoto and Bing Gao Growth and Characterization of Silicon-Germanium Alloys Ichiro Yonenaga Germanium on Silicon: Epitaxy and Applications Daniel Chrastina Self-Interstitials in Silicon and Germanium Alexandra Carvalho and Robert Jones Vacancies in Si and Ge Eiji Kamiyama, Koji Sueoka, and Jan Vanhellemont Self- and Dopant Diffusion in Silicon, Germanium, and Their Alloys Hartmut Bracht Hydrogen in Si and Ge Stefan K. Estreicher, Michael Stavola, and Jorg Weber Point Defect Complexes in Silicon Edouard V. Monakhov and Bengt G. Svensson Defect Delineation in Silicon Materials by Chemical Etching Techniques Bernd O. Kolbesen Investigation of Defects and Impurities in Silicon by Infrared and Photoluminescence Spectroscopies Simona Binetti and Adele Sassella Device Operation as Crystal Quality Probe Erich Kasper and Wogong Zhang Silicon and Germanium Nanocrystals Corrado Spinella and Salvo Mirabella Index