Atomic Layer Deposition —— Principles, Characteristics, and Nanotechnology Applications

----- 原子层沉积：操作和实际应用 第2版

ISBN: 9781118062777 出版年：2013 页码：274 Tommi Kaariainen David Cameron Wiley

Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.