Handbook of Chemical Vapor Deposition —— Principles, Technology and Applications

----- 化学气相沉积手册：原理、技术和应用

ISBN: 9780815514329 出版年：1999 页码：971 Pierson, Hugh O William Andrew_RM

Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications.