Effect of Disorder and Defects in Ion-Implanted Semiconductors: Electrical and Physiochemical Characterization

ISBN: 9780127521459 出版年：1997 页码：321 Academic Press_Series

Defects in ion-implanted semiconductors are important and will likely gain increased importance in the future as annealing temperatures are reduced with successive IC generations. Novel implant approaches, such as MdV implantation, create new types of defects whose origin and annealing characteristics will need to be addressed. Publications in this field mainly focus on the effects of ion implantation on the material and the modification in the implanted layer afterhigh temperature annealing. Electrical and Physicochemical Characterization focuses on the physics of the annealing kinetics of the damaged layer. An overview of characterization tehniques and a critical comparison of the information on annealing kinetics is also presented.Provides basic knowledge of ion implantation-induced defectsFocuses on physical mechanisms of defect annealingUtilizes electrical and physico-chemical characterization tools for processed semiconductorsProvides the basis for understanding the problems caused by the defects generated by implantation and the means for their characterization and elimination